Wang Yi-ming. On the I-V Characteristics for High-Level Injection of pn Junctions[J]. Journal of Beijing University of Technology, 1984, 10(3): 43-49.
    Citation: Wang Yi-ming. On the I-V Characteristics for High-Level Injection of pn Junctions[J]. Journal of Beijing University of Technology, 1984, 10(3): 43-49.

    On the I-V Characteristics for High-Level Injection of pn Junctions

    • By computing the drop of the quasi-Fermi level of majority carriers, the author obtained a rigorous boundary condition and thus the I-V characteristics for a forward-bias pn junction under high-level injection. The computed numerical results show that when Wp/LH<3 (WP is the width of the high-resistivity region, and LH the effective diffusion length), the I-V characteristic follows the exp (qVF/2kT) law, whereas WP/LH ≳ 3, the characteristic departs from this law, and even can not be expressed in the form of exp (qVF/λkT).
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