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Xu Xinfu, Zhai Leheng, Zhang Jianhua, Sun Zhuo, Hou Ge. Ionic Nitriding Process in HCD Apparatus[J]. Journal of Beijing University of Technology, 1993, 19(4): 39-42.
Citation: Xu Xinfu, Zhai Leheng, Zhang Jianhua, Sun Zhuo, Hou Ge. Ionic Nitriding Process in HCD Apparatus[J]. Journal of Beijing University of Technology, 1993, 19(4): 39-42.
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Ionic Nitriding Process in HCD Apparatus

  • Department of Metallic Materials Science and Engineering

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  • Received Date: December 07, 1992
  • Available Online: August 08, 2022
  • Published Date: December 09, 1993
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  • A DLKD-800 HCD apparatus is improved for study on the complex technology of ionitriding-ion plating TiN only in the HCD apparatus. With W6Mo5Cr4V2 specimens, a series of ionitriding tests are made in the improved DLKD-800. The tests yield ideal results and have laid the foundation for investigation on the complex technology.
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