Deposition of the Cubic Boron Nitride Films and Its Application Research

By means of both the transmission electron diffraction (TED) patttern and the Fourier transform infrared (FTIR) spectra, it is proved that the c-BN films with a high content of cubic phase were deposited on (100) oriented silicon wafer by radio frequency (RF) magnet sputtering. The adhesion of c-BN films were improved via the preprocessing of high energy ion beam. And the influences of substrate temperature and bias applied to substrates were studied. Besides the c-BN films were successfully deposited on hard alloys such as WC for cutting tools.