WANG Qin-meng, LIU Zhao-miao, LUO Mu-chang. Elementary Analysis on the Flow in Single-Wafer Silicon CVD Reactor[J]. Journal of Beijing University of Technology, 2001, 27(4): 483-485.
Citation:
WANG Qin-meng, LIU Zhao-miao, LUO Mu-chang. Elementary Analysis on the Flow in Single-Wafer Silicon CVD Reactor[J]. Journal of Beijing University of Technology, 2001, 27(4): 483-485.
WANG Qin-meng, LIU Zhao-miao, LUO Mu-chang. Elementary Analysis on the Flow in Single-Wafer Silicon CVD Reactor[J]. Journal of Beijing University of Technology, 2001, 27(4): 483-485.
Citation:
WANG Qin-meng, LIU Zhao-miao, LUO Mu-chang. Elementary Analysis on the Flow in Single-Wafer Silicon CVD Reactor[J]. Journal of Beijing University of Technology, 2001, 27(4): 483-485.
Elementary Analysis on the Flow in Single-Wafer Silicon CVD Reactor
Flow pattern in single-wafer silicon CVD reactors during the process of vapour deposition is tentatively studied through the numerical solution of the 3-D laminar Navier-Stokes equations. The research indicates that Non-axisymmetric flows may occur in the axi-symmetric solid owing to buoyancy effects alone.
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