Characterization of C60 Films Grown via Hot-wall Epitaxy
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Graphical Abstract
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Abstract
The growth characteristics of C60 films grown at different substrate temperatures via hot-wall epitaxy is investigated. Upon X-ray diffraction, it rurns out tbat entirely (111) oriented C60 films are epitaxially grown on fluorophlogopite (001) plane at substrate temperatures higher that 160℃. Moreover, variations of crystalline integrity and crystal size with substrate temperatures are discussed.
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