Effects of Deposition Parameters on Microstructure of Magnetron Sputtered Ti Films and the Following Anodization

The crystalline titanium films on conductive glass(FTO) with columnar structure were prepared by using DC magnetron sputtering approach in this paper.The influences of the sputtering current and substrate temperature on microstructure of titanium films were investigated.The impacts of columnar crystalline structure on the structural morphology of TiO₂ nanotubes via anodization were also analysised.The morphology and structure of the samples were identified by means of field emission scanning electron microscope(FE-SEM) and X-ray diffractometry(XRD).It is found that,with the sputtering current increasing,the grain size of titanium film increases,but the denseness increases at first,and then decreases.Both grain size and the denseness of titanium films increase with the temperature from 300 ℃ to 450 ℃,and the columnar structure become more uniform.The anodization process is applied to the sputter-deposited titanium film and the results show that titanium films which have compact columnar crystalline structure are benefitial for the growth of TiO₂ nanotubes.