Calculation of Plated UF DeviceUnder Instable Condition

Under instable condition on pulsation feed, the surface shearing stress along membrane passage of the plate-frame UF device was studied. The result shows experiments that to a great extent the, thickness of deposit cover on membrane surface dependes on the fluid flowing velocity in. membrane channel, the amplitude and frequency. When Re<200, the instable surface shearing stress can efficiently eliminate foul cover deposited on membrane surface and thus increase membrane flux.