Laser Physical Vapour Deposition of Al₂O₃ Film

An introdution to research on laser PVD equipment and its manufacture are presented. Using this equipment and 1.5 kW continue wave CO₂ laser. the deposition of Al₂O₃ film on substrate of Ni and SiO₂ is realized. The process factors, such as the influence of the substrate temperature, the pressure in the vaccum chamber and the laser power on deposition rate of the film are discussed. In order to identify the film structure, X-ray refraction analysis is made, and the nibal result shows that the film structure is amorphous. Also the property of the film is studied.