Field Emission Characteristic and Mechanism of a Novel Diamond Films Cathode

Chen Guanghua; Zhang Yang; Zhang Shengjun; Song Xuemei; Li Yinglan

doi:10.3969/j.issn.0254-0037.2000.03.024

Chen Guanghua, Zhang Yang, Zhang Shengjun, Song Xuemei, Li Yinglan. Field Emission Characteristic and Mechanism of a Novel Diamond Films Cathode[J]. Journal of Beijing University of Technology, 2000, 26(3): 116-119. DOI: 10.3969/j.issn.0254-0037.2000.03.024

Citation:

Chen Guanghua, Zhang Yang, Zhang Shengjun, Song Xuemei, Li Yinglan. Field Emission Characteristic and Mechanism of a Novel Diamond Films Cathode[J]. Journal of Beijing University of Technology, 2000, 26(3): 116-119. DOI: 10.3969/j.issn.0254-0037.2000.03.024

Citation:

Chen Guanghua, Zhang Yang, Zhang Shengjun, Song Xuemei, Li Yinglan. Field Emission Characteristic and Mechanism of a Novel Diamond Films Cathode[J]. Journal of Beijing University of Technology, 2000, 26(3): 116-119. DOI: 10.3969/j.issn.0254-0037.2000.03.024

Field Emission Characteristic and Mechanism of a Novel Diamond Films Cathode

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Field emitter is the key of vacuum microelectronic devices. A novel diamond films field emission cathode, with characteristic of threshold voltage as low as 1.09 V/μm and emission current density as high as 418 mA/cm², was reported. It was fabricated with a microwave CVD technique. The emission mechanism was also investigated.

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Field Emission Characteristic and Mechanism of a Novel Diamond Films Cathode

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