张万荣, 高玉珍, 李志国, 程尧海, 孙英华, 陈建新, 沈光地, 穆杰. 高温大电流应力对TiAl/GaAs和TiPtAu/GaAs Schottky二极管Richardson图的影响[J]. 北京工业大学学报, 2000, 26(2): 1-4.
    引用本文: 张万荣, 高玉珍, 李志国, 程尧海, 孙英华, 陈建新, 沈光地, 穆杰. 高温大电流应力对TiAl/GaAs和TiPtAu/GaAs Schottky二极管Richardson图的影响[J]. 北京工业大学学报, 2000, 26(2): 1-4.
    Zhang Wanrong, Gao Yuzhen, Li Zhiguo, Cheng Yaohai, Sun Yinghua, Chen Jianxin, Shen Guangdi, Mu Jie. Effect of High Temperature and High Current Stress on Richardson Plots of TiAl/GaAs and TiptAu/GaAs Schottky Diodes[J]. Journal of Beijing University of Technology, 2000, 26(2): 1-4.
    Citation: Zhang Wanrong, Gao Yuzhen, Li Zhiguo, Cheng Yaohai, Sun Yinghua, Chen Jianxin, Shen Guangdi, Mu Jie. Effect of High Temperature and High Current Stress on Richardson Plots of TiAl/GaAs and TiptAu/GaAs Schottky Diodes[J]. Journal of Beijing University of Technology, 2000, 26(2): 1-4.

    高温大电流应力对TiAl/GaAs和TiPtAu/GaAs Schottky二极管Richardson图的影响

    Effect of High Temperature and High Current Stress on Richardson Plots of TiAl/GaAs and TiptAu/GaAs Schottky Diodes

    • 摘要: 研究了高温和大电流应力对TiAl/GaAs和TiPtAu/GaAs Schottky二极管I~V特性及对Richardson图的影响.研究发现,随着应力时间的增加,在Richardson图上,对TIAI/GaAs Schottky二极管势垒高度快速降低, Richardson常数和二极管的面积之积SA*也快速减少,而TiPtAu/GaAs Schottky 二极管势垒高度和SA*先快速增 加,后趋于稳定常数.在I~V曲线上, TiAl/GaAs Schottky 二极管反向饱和电疣增加, TiPtAu/GaAs Schottky 二极管反向饱和电流先快速减少,后趋于常数.这是由于在金属/GaAs界面形成了金属间化合物的结果.

       

      Abstract: Effect of high temperature and high current stress on I~V characteristics and Richardson plots of TiAl/GaAs and TiptAu/GaAs Schottky diodes are studied. It is found that as stressing time increases, for TiAl/GaAs Schottky diode, the banter height decreases rapidly, the product of Richardson constant SA* and area S of diode decreases quickly, whereas for TiptAu/GaAs Schottky diode, the barrier height and the product of SA* and S increase first and then trends to be a constant. In the I~V characteristics, as stressing time increases, the saturation current of TiAl/GaAs Schottky diodes increases, for TiptAu/GaAs Schottky diodes, the saturation current decreases first and then trends to be a constant. These results have been attributed to the intermetallic compounds formed formed in the metal/GaAs interface.

       

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