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    徐信夫, 翟乐恒, 张建华, 孙灼, 侯革. 空心阴极离子镀膜机中进行离子渗氮的探索[J]. 北京工业大学学报, 1993, 19(4): 39-42.
    引用本文: 徐信夫, 翟乐恒, 张建华, 孙灼, 侯革. 空心阴极离子镀膜机中进行离子渗氮的探索[J]. 北京工业大学学报, 1993, 19(4): 39-42.
    shu
    Xu Xinfu, Zhai Leheng, Zhang Jianhua, Sun Zhuo, Hou Ge. Ionic Nitriding Process in HCD Apparatus[J]. Journal of Beijing University of Technology, 1993, 19(4): 39-42.
    Citation: Xu Xinfu, Zhai Leheng, Zhang Jianhua, Sun Zhuo, Hou Ge. Ionic Nitriding Process in HCD Apparatus[J]. Journal of Beijing University of Technology, 1993, 19(4): 39-42.
    shu

    空心阴极离子镀膜机中进行离子渗氮的探索

    Ionic Nitriding Process in HCD Apparatus

      摘要
    • 摘要: 对DLKD-800到离子镀膜机进行了技术改进,在改进后的DLKD-800型离子镀膜机中,用W6Mo5Gr4V2的试片(Ø15×4)进行了离子渗氮的探索试验,试验取得较理想的结果,为离子渗镀复合工艺的研究奠定了基础。

       

      Abstract: A DLKD-800 HCD apparatus is improved for study on the complex technology of ionitriding-ion plating TiN only in the HCD apparatus. With W6Mo5Cr4V2 specimens, a series of ionitriding tests are made in the improved DLKD-800. The tests yield ideal results and have laid the foundation for investigation on the complex technology.

       

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