汞微电极阳极溶出伏安法测定痕量铜

齐明春; 彭淑环

齐明春, 彭淑环. 汞微电极阳极溶出伏安法测定痕量铜[J]. 北京工业大学学报, 1993, 19(4): 115-120.

引用本文:

齐明春, 彭淑环. 汞微电极阳极溶出伏安法测定痕量铜[J]. 北京工业大学学报, 1993, 19(4): 115-120.

Qi Mingchun, Peng Shuhuan. Anodic Stripping Voltrammertic Determination of Trace of Trace Copper in Micro-Sample with a Mercury Unltramicroclectrode[J]. Journal of Beijing University of Technology, 1993, 19(4): 115-120.

Citation:

Qi Mingchun, Peng Shuhuan. Anodic Stripping Voltrammertic Determination of Trace of Trace Copper in Micro-Sample with a Mercury Unltramicroclectrode[J]. Journal of Beijing University of Technology, 1993, 19(4): 115-120.

汞微电极阳极溶出伏安法测定痕量铜

Anodic Stripping Voltrammertic Determination of Trace of Trace Copper in Micro-Sample with a Mercury Unltramicroclectrode

摘要

摘要: 研究了在NH₄OH-NH₄Cl介质中,用玻碳电极同位镀汞膜阳级溶出伏安法测定样品中痕量铜,检测限达10^-13 mol/L^-1,可用于多种样品的分析。

Abstract: The Determination of trace copper has been studied by anodic stripping voltammetry with a mercury-plated glassy elecrode in NH₄OH-NH₄Cl supporting elecrolyte solution. The detertion accurate within concentration is 10^-13 mol/L^-1. Various samples can be anamed by this techique.

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