宋雪梅, 王亮, 陈宇, 孟祥曼, 王波, 严辉. ECR等离子体刻蚀对玻璃光学和润湿性能的影响(邀请论文)[J]. 北京工业大学学报, 2015, 41(12): 1897-1900. DOI: 10.11936/bjutxb2015060085
    引用本文: 宋雪梅, 王亮, 陈宇, 孟祥曼, 王波, 严辉. ECR等离子体刻蚀对玻璃光学和润湿性能的影响(邀请论文)[J]. 北京工业大学学报, 2015, 41(12): 1897-1900. DOI: 10.11936/bjutxb2015060085
    SONG Xue-mei, WANG Liang, CHEN Yu, MENG Xiang-man, WANG Bo, YAN Hui. Influence of Electron Cyclotron Resonance Plasma Etching on the Optical and Wetting Properties of Glass(Invited Paper)[J]. Journal of Beijing University of Technology, 2015, 41(12): 1897-1900. DOI: 10.11936/bjutxb2015060085
    Citation: SONG Xue-mei, WANG Liang, CHEN Yu, MENG Xiang-man, WANG Bo, YAN Hui. Influence of Electron Cyclotron Resonance Plasma Etching on the Optical and Wetting Properties of Glass(Invited Paper)[J]. Journal of Beijing University of Technology, 2015, 41(12): 1897-1900. DOI: 10.11936/bjutxb2015060085

    ECR等离子体刻蚀对玻璃光学和润湿性能的影响(邀请论文)

    Influence of Electron Cyclotron Resonance Plasma Etching on the Optical and Wetting Properties of Glass(Invited Paper)

    • 摘要: 为了提高太阳能电池盖板玻璃的透过率和自清洁性能,采用电子回旋共振(ECR)等离子体刻蚀与金属颗粒掩膜结合的方法刻蚀硼硅酸盐玻璃,采用扫描电镜(SEM)对刻蚀后玻璃表面形貌进行了观察,采用分光光度计测量了刻蚀前后玻璃透过率变化,并用接触角仪测定了刻蚀前后玻璃表面润湿性变化.结果表明:经过ECR等离子体刻蚀后,在玻璃表面形成多山峰状纳米结构,平均尺寸约在80~140 nm,并有效提高了玻璃的可见光透过率,尤其是在有偏压刻蚀后透过率由原来91%提高到94.4%,同时,玻璃表面亲水性增强,接触角θc由原来的47.2°变为7.4°,自清洁性能得到提高.

       

      Abstract: In order to improve the transmittance and self-cleaning properties of solar cell cover glass. The borosilicate glass was etched by electron cyclotron resonance ( ECR ) plasma etching with metal nanoparticles mask. The glass surface after etching was observed by scanning electron microscopy ( SEM ) . The change of the transmittance of the glass after etching was measured by the UV-VIS spectrophotometer. The wetting property of the bare and etching glass was determined by the contact angle instrument. The results show the mountainous structure was formed on glass substrate after ECR plasma etching,and its average size ranges from 80 nm to 140 nm. The visible light transmittance of the glass is effectively improved. It increases from 91% to 94. 4% with the bias etching. Moreover, It enhancs the hydrophilicity on the surface of the glass. The lower contact angle (θc) of 7. 4° is obtained compared to the bare glass substrate (θc~47. 2°). The self-cleaning properties are improved.

       

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