新型金刚石薄膜场电子发射的特性

Field Emission Characteristic and Mechanism of a Novel Diamond Films Cathode

摘要: 介绍了用微波CVD法制备的一种新型低阈值电压大电流密度金刚石薄膜场发射冷阴极,阈值电压低于1.09 V/μm,场发射电流密度高达418 mA/cm²,这是目前文献中报道的最好结果之一.文中还探讨了金刚石薄膜场电子发射机制.

Abstract: Field emitter is the key of vacuum microelectronic devices. A novel diamond films field emission cathode, with characteristic of threshold voltage as low as 1.09 V/μm and emission current density as high as 418 mA/cm², was reported. It was fabricated with a microwave CVD technique. The emission mechanism was also investigated.