Abstract: By means of both the transmission electron diffraction (TED) patttern and the Fourier transform infrared (FTIR) spectra, it is proved that the c-BN films with a high content of cubic phase were deposited on (100) oriented silicon wafer by radio frequency (RF) magnet sputtering. The adhesion of c-BN films were improved via the preprocessing of high energy ion beam. And the influences of substrate temperature and bias applied to substrates were studied. Besides the c-BN films were successfully deposited on hard alloys such as WC for cutting tools.