Si/SiGe/Si HBT直流特性的解析模型与模拟

    Analytical Models and Simulation of DC Characteristics of Si/SiGe/Si HBTs

    • 摘要: 在考虑了重掺杂效应、异质结势垒效应、各物理量随温度变化以及背注入空穴电流、BE结空间电荷区复合电流、中性基区复合电流对基极电流贡献后,对Si/SiGe/SiHBT的常温和低温直流特性进行了解析模拟.给出了T=77K和300K时的Si/SiGe HBT Gummel图和电流增益β与集电极电流密度Jc的关系.研究了基区少子寿命对β的影响.模拟显示,Si/SiGe/Si HBT在小电流和中等电流下有良好的常温和低温直流特性,在大电流下,由于异质结势垒效应的存在,电流增益β严重退化.

       

      Abstract: The DC characteristics of Si/SiGe/Si HBTs at room temperature and low temperatures are modelled and simulated analytically. The models account for the following: heavy doping effects, heterojunction barrier effects, the temperature dependence of physical parameters, the base current arising from back injection hole current, the recombination current in both quasi-neutral base, and depletion region of BE junction. The Gummel plot and dependence of current gain of collector current of Si/SiGe/Si HBTs at 300K and 77K are given. Furthermore, the effect of minority carrier lifetime in the base on the current gain is studied. Simulation results show that Si/SiGe/Si HBTs have excellent DC performance both at room temperature and low temperatures in low and middle current regions, and the current gain are seriously degraded because of the presence of heterojunction barrier effects under high collector current.

       

    /

    返回文章
    返回