Abstract: The author reestablished and manufacrured an apparatus of magnetron sputder ion plated films, surveyed the discharging characteristics of magnetron target, and with this apparatus, the technological experiments of titanium nitride coating deposited onto aluminium alloy (LY 16) were progressed. The effects of each technological parameter on the film properties have been studied in detail. The experimental results reveal that higher quality titanium nitride coating deposited at lower temperature of 120℃ to 140℃ can be abtained. the tine structure of the TiN layer is built; the hardness can reach Hv-2200 kg f mm.