高选择渗透性硅膜及其特性
A Silicon-Based Membrane with High Permeability and its Properties
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摘要: 一种具有高选择渗透性的新型硅膜由硅树脂膜裂解制成.膜对H2,O2,N2等气体的渗透系数约102~103Barrer,H2/N2和O2/N2分离因子分别为11~13和3~4.这种硅基膜适合于低于300℃的含氧环境下工业气体的分离.Abstract: A new silicon-based membrane with high permeability was made by pyrolyzing a silicon resin membrane. Its permeability coefficients for H2, O2, N2 are about 102-103 Barter, separation factors for H2/N2 and O2/N2 are 11-13 and 3-4 respectively. This silicon membrane is suitable for industrial gas separation in an oxidizing environment at the temperature of below 300 ℃.
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