SDP法制备非晶Y2O3薄膜用于哈氏(Hastelloy C-276)合金基带表面精修

    Preparation of Amorphous Y2O3 Film by SDP Method for Surface Refining of Hastelloy C-276 Alloy Tapes

    • 摘要: 为了解决哈氏(Hastelloy C-276)合金基带表面粗糙度过大造成不平整的问题,采用溶液沉积平整化技术在哈氏合金表面制备Y2O3非晶薄膜来满足使用要求.通过研究前驱液的稳定性和浓度、热处理温度和涂覆次数对表面粗糙度的影响规律,同时采用高低浓度相结合的方法涂覆非晶薄膜来提高涂覆效率,结果表明:先使用高浓度0.40 mol/L涂覆6次,再使用低浓度0.10 mol/L涂覆6次,获得了表面平均粗糙度Ra值为0.65 nm(5 μm×5 μm)高表面质量的带材,涂覆效率相比使用单一溶度提高了近30%.前驱液浓度越高,溶液粒径越大,前期涂覆效果更佳,后改用低浓度粒径小的前驱液进行表面精修,可以大幅提高涂覆效率.

       

      Abstract: Hastelloy C-276 alloy is the preferred substrate material for preparing second generation of high temperature coated conductors by ion beam assisted deposition. As to Hastelloy C-276 alloy substrate, the Y2O3 amorphous film was prepared directly on the Hastelloy alloy surface via solution deposition planarization technology to meet the subsequent requirements. The effects of precursor stability, precursor concentration, heat treatment temperature and coating times on surface roughness were studied. Meanwhile, focused on the combination of high and low concentration, the coating efficiency was improved. Results show that the coating with a high concentration of 0.40 mol/L for 6 times, and then coating with a low concentration of 0.10 mol/L for 6 times, a high surface quality substrate with the surface average roughness Ra of 0.65 nm (5 μm×5 μm) is obtained, and the coating efficiency is improved by nearly 30% compared with the solution of a single solubility. When the concentration of precursor solution is high, the solution particle size is large, and the earlier coating effect is better. After that, the precursor solution with small particle size in low-concentration solution was used to modify the surface, which can greatly improve the coating efficiency.

       

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